Sivan Pillai Soumya (Author), Vimal Raj (Author), Mohanachandran Nair Sindhu Swapna (Author), S. Sreejyothi (Author), Sankarapanicker Suresh (Author), Sankaranarayana Iyer Sankararaman (Author)

Abstract

The widespread applications of thin films in optronics demand innovative techniques for its characterizations. The work reported here proposes electronic speckle pattern interferometry and fractal-based methods for assessing the quality of thin films taking the industrially relevant molybdenum oxide (MoO3) incorporated niobium oxide (Nb2O5) films. The films with different levels of MoO3 incorporation (1, 2, 3, 5, and 10 wt. %) are prepared by radio frequency sputtering. The study reveals the structure modifications of Nb2O5 from the orthorhombic to monoclinic phases with an associated morphological variation revealed through atomic force microscopy and field-emission scanning electron microscopy analyses. The films’ specklegrams are recorded under thermal stress; the inertia moment (IM) and fractal analyses are computed and compared with the root-mean-square surface roughness of the films. The lacunarity analysis of the AFM films agrees well with the specklegrams. Thus, the lower IM and lacunarity values of the specklegrams can be regarded as indicators of the good quality of thin films.

Keywords

cross-correlation;fractal dimension;inertia moment;

Data

Language: English
Year of publishing:
Typology: 1.01 - Original Scientific Article
Organization: UNG - University of Nova Gorica
UDC: 53
COBISS: 113431555 Link will open in a new window
ISSN: 1560-2303
Views: 497
Downloads: 0
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Other data

URN: URN:SI:UNG
Type (COBISS): Not categorized
Pages: str. 1-15
Volume: ǂVol. ǂ61
Issue: ǂno. ǂ4
Chronology: 2022
DOI: 10.1117/1.OE.61.4.044106
ID: 15786717