N. Pastukhova (Author), Andraž Mavrič (Author), Yanbo Li (Author)

Abstract

Substantial progress has been made in the photoelectrochemical (PEC) field to understand the photoelectrode behavior, semiconductor‐electrolyte interface, and photocorrosion, enabling new photoelectrode architectures with higher photocurrent, reduced photovoltage losses, and longer lifetime. Nevertheless, for practical PEC applications additional efforts are still needed to optimize all components of the photoelectrodes, including the light absorbing semiconductors, the layers for charge extraction, charge transfer, corrosion protection, and catalysis. In this regard, atomic layer deposition (ALD) offers new opportunities due to the monolayer‐by‐monolayer deposition approach, allowing preparation of conformal films with precisely controlled thickness and composition. As the ALD instruments are becoming widely accessible, this review aims to make an overview of the applications for photoelectrodes fabrication. The deposition of semiconductors onto flat and nano‐textured substrates, the deposition of ultrathin interlayers to ease charge transport by energy band alignment and surface states passivation, the deposition of corrosion protection layers, and finally, the possibilities for high catalyst dispersion is presented.

Keywords

atomic layer deposition;charge recombination;charge transfer;photocorrosion;photoelectrochemical water splitting;

Data

Language: English
Year of publishing:
Typology: 1.02 - Review Article
Organization: UNG - University of Nova Gorica
UDC: 620.1/.2
COBISS: 53115651 Link will open in a new window
ISSN: 2196-7350
Views: 1586
Downloads: 134
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Other data

URN: URN:SI:UNG
Pages: str. 1-22
Volume: ǂVol. ǂ8
Issue: ǂiss. ǂ7
Chronology: Apr. 2021
DOI: 10.1002/admi.202002100
ID: 12589011