Atomic layer deposition for the photoelectrochemical applications

N. Pastukhova (Avtor), Andraž Mavrič (Avtor), Yanbo Li (Avtor)

Povzetek

Substantial progress has been made in the photoelectrochemical (PEC) field to understand the photoelectrode behavior, semiconductor‐electrolyte interface, and photocorrosion, enabling new photoelectrode architectures with higher photocurrent, reduced photovoltage losses, and longer lifetime. Nevertheless, for practical PEC applications additional efforts are still needed to optimize all components of the photoelectrodes, including the light absorbing semiconductors, the layers for charge extraction, charge transfer, corrosion protection, and catalysis. In this regard, atomic layer deposition (ALD) offers new opportunities due to the monolayer‐by‐monolayer deposition approach, allowing preparation of conformal films with precisely controlled thickness and composition. As the ALD instruments are becoming widely accessible, this review aims to make an overview of the applications for photoelectrodes fabrication. The deposition of semiconductors onto flat and nano‐textured substrates, the deposition of ultrathin interlayers to ease charge transport by energy band alignment and surface states passivation, the deposition of corrosion protection layers, and finally, the possibilities for high catalyst dispersion is presented.

Ključne besede

atomic layer deposition;charge recombination;charge transfer;photocorrosion;photoelectrochemical water splitting;

Podatki

Jezik:	Angleški jezik
Leto izida:	2021
Tipologija:	1.02 - Pregledni znanstveni članek
Organizacija:	UNG - Univerza v Novi Gorici
UDK:	620.1/.2
COBISS:	53115651
ISSN:	2196-7350
Št. ogledov:	1586
Št. prenosov:	134
Ocena:	0 (0 glasov)
Metapodatki:

Ostali podatki

URN:	URN:SI:UNG
Strani:	str. 1-22
Letnik:	ǂVol. ǂ8
Zvezek:	ǂiss. ǂ7
Čas izdaje:	Apr. 2021
DOI:	10.1002/admi.202002100
ID:	12589011