Tomislav Cigula (Author), Regina Fuchs-Godec (Author), Miroslav Gojo (Author), Mojca Slemnik (Author)

Abstract

The structure of the porous aluminium-oxide layer, which builds non-image areas, has the most significant influence on the quality of final graphical product. This paper presents the results of the application of EIS in the characterisation and detection of changes on the aluminium-oxide layer caused by chemical processing in highly alkaline solution. The Al2O3 layer was characterised using SEM, fractal dimension and surface free energy calculationand EIS analysis. The results of the investigation showed that chemical processing has a significant influence on the structure of aluminiumoxide which could lead to a decrease in the quality of the printing plate. EIS enables the detection of changes on the aluminium- oxide layer. Thetwo equivalent circuits are proposed. Based on modelling with the obtained EIS spectra, precise evaluation of developing time in which complete removal of the photoactive layer is achieved. This makes EIS a powerful tool in optimizing chemical processing of lithographic printing plates.

Keywords

printing plate;chemical processing;SEM;surface free energy;EIS;

Data

Language: English
Year of publishing:
Typology: 1.01 - Original Scientific Article
Organization: UM FKKT - Faculty of Chemistry and Chemical Engineering
UDC: 66
COBISS: 16265238 Link will open in a new window
ISSN: 1318-0207
Views: 975
Downloads: 71
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Other data

Secondary language: Slovenian
Secondary abstract: Struktura porozne plasti aluminijevega oksida, ki predstavlja t.i. tiska prosto površino ima pomemben vpliv na kvaliteto tiska. Delo predstavlja uporabo impedančne spektroskopije (EIS) v namene detekcije strukturnih sprememb povzročenih pri kemijski obdelavi površine v močno alkalni raztopini. Strukturne spremembe plasti aluminijevega oksida, nastale v procesu delovanja razvojnega medija na površino smo razložili še z uporabo SEM, fraktalne analize in merjenjem površinske energije. Analize so pokazale, da ima proces kemijske obdelave tiskarske plošče bistven vpliv na končno kvaliteto le-te. S pomočjo EIS lahko uspešno predvidimo spremembe v plasti aluminijevega oksida. Uporabili smo dva različna tipa nadomestnega električnega vezja. Na osnovi le-teh smo lahko natančno predvideli optimalni čas razvijanja pri katerem je bil foto-aktivni film odstranjen v celoti. Vse to daje velik pomen uporabi EIS v namene optimizacije kemijskega procesa v postopku priprave litografskih tiskarskih plošč.
Secondary keywords: tiskarska plošča;kemična obdelava;SEM;površinska energija;EIS;
URN: URN:NBN:SI
Type (COBISS): Scientific work
Pages: str. 513-519
Volume: ǂVol ǂ59
Issue: ǂno. ǂ3
Chronology: 2012
ID: 1439138