Language: | Slovenian |
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Year of publishing: | 1992 |
Typology: | 1.01 - Original Scientific Article |
Organization: | UM FGPA - Faculty of Civil Engineering, Transportation Engineering and Architecture |
Publisher: | Društvo za vakuumsko tehniko Slovenije |
UDC: | 539.216:539.23 |
COBISS: |
4402180
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ISSN: | 0351-9716 |
Parent publication: | Vakuumist |
Views: | 1127 |
Downloads: | 26 |
Average score: | 0 (0 votes) |
Metadata: |
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Secondary language: | Unknown |
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Secondary title: | Ionized cluster beam thin film deposition, ICB. |
Secondary abstract: | The description of the method for the thermal vacuum evaporation of suitable substance, used for the low temperature deposition and epitaxy of high-qualitythin films by the ionized cluster beam method (ICB), is presented. |
Secondary keywords: | vacuum techniques;ICB;ionized cluster beam;thin films; |
URN: | URN:NBN:SI |
Type (COBISS): | Not categorized |
Pages: | str. 15-20 |
Volume: | ǂVol. ǂ29 |
Issue: | ǂno. ǂ4 |
Chronology: | 1992 |
ID: | 1754754 |